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Canon releases FPA-3030i6 semiconductor lithography system for small wafers, with a newly developed lens and a variety of options to meet the growing demand for power devices

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FPA-3030i6 (Source: Canon Central and North Africa (CCNA) | 4 hours ago)

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The newly developed lens is notable for high transmittance compared to previous lenses (conceptual image) (Source: Canon Central and North Africa (CCNA) | 4 hours ago)

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Canon releases FPA-3030i6 semiconductor lithography system for small wafers, with a newly developed lens and a variety of options to meet the growing demand for power devices (Source: Canon Central and North Africa (CCNA) | 4 hours ago)

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